Spin coater
Description
The Laurell WS-650-Mz-23NPP spin coater is a desktop system to produce accurate, uniform, defect-free thin films on substrates and wafers. The system includes a precision dispenser and a spinner.
Specifications
- Rotation speed: up to 12,000 rpm
- Substrate size: round wafers up to 150 mm (6″), square substrates up to 127 mm x 127 mm (5″x5″) and irregularly shaped wafer pieces.
Applications
The system performs spin coating of a wide range of materials such as photoresists, photosensitive dielectrics,
spin-on materials (SU-8, PI, silicone, etc.) and variety of aqueous solutions.
The typical thickness of the thin films is 0.2 to 10 μm.
